Etching Sample Clauses

Etching. Wet chemical etching, plasma etching, and the techniques used in deep silicon etching can be included in the area etching. Patterning 2D materials is critical for their incorporation into integrated circuitry as well as the general fabrication of nanostructures. Patterning by chemical etching processes has enabled the fabrication of various forms of complex circuitry and logic gates11 Etch processes are needed for complete material removal, as well as controlled thinning in a layer-by- layer manner. Popular chemical etching processes can be generally grouped into the following categories: (1) wet chemical, (2) reactive gas-assisted, (3) plasma/reactive ion, and (4) atomic layer etching (ALE)11