Mask Work Rights definition

Mask Work Rights means (i) any rights in mask works, as defined in 17 U.S.C. Section 901, whether registered or unregistered, including applications for registration thereof, and (ii) any foreign rights in semiconductor topologies under the laws of any jurisdiction, whether registered or unregistered, including applications for registration thereof.
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Mask Work Rights means rights under the United States Semiconductor Chip Protection Act of 1984, as amended from time to time, or under any similar equivalent laws in countries other than the United States.
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Mask Work Rights has the meaning set forth in the definition of “Intellectual Property Rights” in this Section 1.1.
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Examples of Mask Work Rights in a sentence

  • Mask Work Rights" means (i) any rights in mask works, as defined in 17 U.S.C. Section 901, whether registered or unregistered, including applications for registration thereof, and (ii) any foreign rights in semiconductor topologies under the laws of any jurisdiction, whether registered or unregistered, including applications for registration thereof.

  • Under Mask Work Rights included in JDSU Licensed IPR, (i) to reproduce and have reproduced (subject to Section 3.2), by optical, electronic or any other means, mask works and semiconductor topologies embodied in Lumentum Licensed Products solely in the Lumentum Field, (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied, and (iii) to permit Third Parties to do any of the foregoing.

  • Under the Transferred Mask Work Rights included in Lumentum Licensed IPR, (i) to reproduce and have reproduced (subject to Section 4.2), by optical, electronic or any other means, mask works and semiconductor topologies embodied in JDSU Licensed Products solely in the JDSU Field, (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied, and (iii) to permit Third Parties to do any of the foregoing.

  • Under the Mask Work Rights included in the Houston Licensed IPR, to engage in any Seattle Licensed Activities, including (i) to reproduce and have reproduced (subject to Section 3.2 (Have Made Rights)), by optical, electronic, lithographic or any other means, mask works and semiconductor topologies embodied in Seattle Licensed Products and (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied.

  • Under its and their Mask Work Rights in and to the Business Technology, (i) to reproduce and have reproduced (subject to Section 3.2), by optical, electronic or any other means, mask works and semiconductor topologies included in the Business Technology and embodied in Verigy Products solely in the Verigy Field, (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied, and (iii) to permit Third Parties to do any of the forgoing.

  • Under the Mask Work Rights included in the Seattle Licensed IPR, to engage in any Houston Licensed Activities, including (i) to reproduce and have reproduced (subject to Section 4.2 (Have Made Rights)), by optical, electronic, lithographic or any other means, mask works and semiconductor topologies embodied in Houston Licensed Products and (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied.

  • Under Mask Work Rights included in Licensed Agilent IPR, (i) to reproduce and have reproduced (subject to Section 3.2), by optical, electronic or any other means, mask works and semiconductor topologies included in the Business Technology and embodied in Keysight Products solely in the Keysight Field, (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied, and (iii) to permit Third Parties to do any of the foregoing.

  • On February 19, 2018, Bio Barra ceased to be a partner, transforming the entity into a closely-held Corporation and 15% of the equity interest was transferred to the new minority partner Geo Energética Participações S.A..

  • Ramtron hereby agrees, subject to the terms of this Amendment No. 3, to grant to Hitachi and/or its Subsidiaries a non-exclusive, non-sublicensable, non- transferable, non-assignable, worldwide, perpetual license, under its Trade Secret Rights, Copyrights and/or Mask Work Rights, to utilize Ramtron Base FRAM Technology so as to develop, design, make, have made, use, sell and/or otherwise dispose of RF/ID Products.

  • HP further grants, conveys and assigns (and agrees to cause its appropriate Subsidiaries to grant, convey and assign) to Agilent all its (and their) right, title and interest in and to any and all causes of action and rights of recovery for past infringement of Copyrights, Database Rights and Mask Work Rights in and to the Agilent Owned ICBD Technology, and for past misappropriation of trade secrets in and to the Agilent Owned ICBD Technology.


More Definitions of Mask Work Rights

Mask Work Rights means rights under the United States Semiconductor Chip Protection Act of 1984, as amended from time to time, and under any similar counterpart laws in countries other than the United States.
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Mask Work Rights means rights associated with Mask Works, whether or not registered or the subject of an application for registration and whether or not registrable.
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Mask Work Rights means those rights relating to an integrated circuit, as specified by the United States Protection Act of 1984 or an, analogous statute of any other country of the world, which have a first effective filing date in any country prior to the expiration or termination of this Agreement.
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Mask Work Rights means any and all rights in and to mask works arising under any applicable Law, and all applications, registrations and renewals thereof.
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Mask Work Rights means all mask work rights worldwide arising under statutory or common law, including without limitation mask work registrations, and any analogous right.
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Related to Mask Work Rights

  • Mask Works are all mask works or similar rights available for the protection of semiconductor chips, now owned or later acquired.

  • Mask Work means a series of related images, however fixed or encoded: (i) having or representing the predetermined, three dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (ii) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product. (See 17 U.S.C. 901.)

  • Trademark Rights means all common law and other rights (but in no event any of the obligations) in and to the Trademarks in the United States and any state thereof and in foreign countries.

  • Work/ works means work / works to be executed in accordance with the contract.

  • Foreground Intellectual Property means all Intellectual Property developed by either Party pursuant to this Agreement;

  • Copyrights means any and all copyright rights, copyright applications, copyright registrations and like protections in each work or authorship and derivative work thereof, whether published or unpublished and whether or not the same also constitutes a trade secret, now or hereafter existing, created, acquired or held.

  • Background Intellectual Property Rights means Intellectual Property Rights owned, controlled or furnished by either Party other than Foreground Intellectual Property Rights.

  • Background Intellectual Property means all Intellectual Property introduced and required by either Party to give effect to their obligations under this Agreement owned in whole or in part by or licensed to either Party or their affiliates prior to the Commencement Date or developed after the Commencement Date otherwise pursuant to this Agreement;

  • Domain Names means all Internet domain names and associated URL addresses in or to which any Grantor now or hereafter has any right, title or interest.

  • Copyright and Similar Rights means copyright and/or similar rights closely related to copyright including, without limitation, performance, broadcast, sound recording, and Sui Generis Database Rights, without regard to how the rights are labeled or categorized. For purposes of this Public License, the rights specified in Section 2(b)(1)-(2) are not Copyright and Similar Rights.

  • Copyright also means copyright-like laws that apply to other kinds of works, such as semiconductor masks.

  • Registered Intellectual Property Rights means all Intellectual Property Rights that are the subject of an application, certificate, filing, registration, or other document issued by, filed with, or recorded by, any Governmental Authority in any jurisdiction.

  • Intellectual Property Rights (IPR) (11/18) means any patent rights, copyrights, trade secrets, trade names, service marks, trademarks, trade dress, moral rights, know-how and any other similar rights or intangible assets to which rights of ownership accrue, and all registrations, applications, disclosures, renewals, extensions, continuations, or reissues of the foregoing now or hereafter in force. “Key Personnel” (11/18) means the specific individuals identified in Section 3.11 to fill Key Positions.

  • Patent Applications means all published and unpublished nonprovisional and provisional patent applications, reexamination proceedings, invention disclosures and records of invention, applications for certificates of invention and priority rights, in any country and regardless of formal name, including without limitation, substitutions, continuations, continuations-in-part, divisions, renewals, revivals, reissues, re-examinations and extensions thereof.

  • Licensed Intellectual Property Rights means all Intellectual Property Rights owned by a third party and licensed or sublicensed to either the Company or any of its Subsidiaries.

  • Intellectual Property Rights or IPR means copyright, rights related to or affording protection similar to copyright, rights in databases, patents and rights in inventions, semi-conductor topography rights, trade marks, rights in internet domain names and website addresses and other rights in trade or business names, designs, Know-How, trade secrets and other rights in Confidential Information; applications for registration, and the right to apply for registration, for any of the rights listed at (a) that are capable of being registered in any country or jurisdiction; and all other rights having equivalent or similar effect in any country or jurisdiction;

  • Internet Domain Names means all rights, title and interests (and all related IP Ancillary Rights) arising under any Requirement of Law in or relating to Internet domain names.

  • Background Invention means an Invention conceived and first actually reduced to practice before the Effective Date.

  • Background IPR means any Intellectual Property Rights (other than Project IPR) belonging to either party before the Commencement Date or not created in the course of or in connection with the Project;

  • Patents means all patents, patent applications and like protections including without limitation improvements, divisions, continuations, renewals, reissues, extensions and continuations-in-part of the same.

  • Intellectual Property (IP) means all copyright, rights in relation to inventions (including patent rights and unpatented technologies), plant varieties, registered and unregistered trademarks (including service marks), registered designs, confidential information (including trade secrets and know-how), mask-works and integrated circuit layouts, and all other rights resulting from intellectual activity in the industrial, scientific, literary or artistic fields;

  • Sui Generis Database Rights means rights other than copyright resulting from Directive 96/9/EC of the European Parliament and of the Council of 11 March 1996 on the legal protection of databases, as amended and/or succeeded, as well as other essentially equivalent rights anywhere in the world.

  • Joint Intellectual Property Rights means any work under the Subcontract, which:

  • Foreground IPR means any IPRs that are generated as a result of the activities conducted within the framework of the Project concerned as specified in the corresponding Project Agreement;

  • Mask means a peptide linked to an Antibody that is capable of inhibiting the specific binding of the Antibody to its Target.

  • Licensee Improvements means Improvements created, conceived, or reduced to practice by or for Licensee.